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Leti Alternative Lithography Workshop

From 3/1/2018 to 3/1/2018
Marriot Hotel, San Jose, California

Thank you for attending Leti's Alternative Lithography Workshop

To download our presentations, please click below.

​Introduction  - Leti Ecosystem  by Laurent PAIN, Leti

Accelerated innovation through strategic collaboration: a view from an equipment supplier by Olivier VATEL, SCREEN

​MAPPER: High throughput Maskless Lithography by  Marco WIELAND, MAPPER 

​Dynamic Blanker Integration Into The MAPPER Tool: The Dynamics Of An Announced Success, by  S.LANDIS, Leti 

​Directed Self Assembly Of Block Copolymers: From Materials To Integration by   R.TIRON  & C.NAVARRO, Leti 

​EVG SmartNIL® Technology for Patterning Requirements of More than Moore Applications by Dr. Martin EIBEHUBER, EVG

The Leti Nil Assessment Platform by H.TEYSSEDRE, Leti 

The Leti Lithopole By Laurent PAIN, Leti 

 The Future isn't what is used to be by Yan  BORODOVSKY

In partnership with ARKEMA, EVG, and MAPPER, Leti will present its advanced lithography programs, including an assessment of three alternative patterning technologies currently implemented in a Leti pilot line environment: DSA, Full wafer scale imprint and Massively parallel Direct write. Presentations will be both technical and business oriented.

This event is generously sponsored by SCREEN and Ebeam initiative.  

Read more and register

Practical information

​Marriot Hotel, San Jose, California


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