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Leti Alternative Lithography Workshop

From 3/1/2018 to 3/1/2018
Marriot Hotel, San Jose, California


In partnership with ARKEMA, EVG, and MAPPER, Leti will present its advanced lithography programs, including an assessment of three alternative patterning technologies currently implemented in a Leti pilot line environment: DSA, Full wafer scale imprint and Massively parallel Direct write. Presentations will be both technical and business oriented.

This event is generously sponsored by SCREEN and Ebeam initiative.  

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Practical information

​Marriot Hotel, San Jose, California

Contact: Laurent.pain@cea.fr

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