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SL-DRT-24-0553

Published on 7 December 2023
SL-DRT-24-0553
Research fieldAdvanced nano characterization

Domaine-SMetrology

ThemeTechnological challenges

Theme-SEngineering sciences

Field
Advanced nano characterization Technological challenges Metrology Engineering sciences DRT DPFT SMCP L2MD Grenoble https://www.linkedin.com/in/yoann-blancquaert-780a1028/
Title
Scatterometry measurement of the exposure focal length of photolithography tools
Abstract
Since the late 2000s with the advent of 45nm CMOS nodes, the control of critical dimensions (CD) of the structures in the photolithography stage has become critical to the reliability of printed circuit boards. Optical photolithography remains the most economical and widespread technique for high volume production in the semiconductor industry. For this type of equipment, manufacturers have focused on increasing the numerical aperture of the exposure lens, reducing sources of optical aberrations and on metrology to ensure efficient monitoring of their machines. These developments were possible at the expense of the depth of field of the exposure. To avoid altering the images transferred to the photosensitive resins, and ultimately have a device failure, it is essential to give a value as accurate and precise as possible of this size. To meet the growing needs of process control and lithography tools required by the most advanced technologies, metrology techniques based on analysis of reflected signals are massively used. Although this methodology is well suited to current CMOS technologies (CMOS14nm and earlier), it is unlikely to address more advanced technologies, so other techniques must emerge, such as techniques based on the analysis of the diffracted signal (scatterometry).
Formation
Master 2 microélectronique, nanotechnologie, sciences des matériaux, physique Technological Research
Contact person
BLANCQUAERT Yoann CEA DRT/DPFT//L2MD CEA-Leti, MINATEC Campus, 17 rue des Martyrs - 38054 GRENOBLE Cedex 9, France 0438781664 yoann.blancquaert@cea.fr
University/ graduate school
Université Grenoble Alpes Electronique, Electrotechnique, Automatique, Traitement du Signal (EEATS)
Thesis supervisor
LTM
Location
Département des Plateformes Technologiques (LETI) Service de Métrologie et de Caractérisation Physique Laboratoire Microscopie Mesures et Défectivité
Start1/10/2024

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