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Blister formation mechanism during high dose implanted photoresist stripping

Published on 1 October 2018
Blister formation mechanism during high dose implanted photoresist stripping
Description
 
Date 
Authors
Croisy M., Pargon E., Jenny C., Richard C., Guiheux D., Joblot S., Campo A., Possémé N.
Year2018-0080
Source-TitleMicroelectronic Engineering
Affiliations
STMicroelectronics, 850 rue Jean Monnet, Crolles Cedex, France, CNRS-LTM, 17 avenue des Martyrs, Cedex 9, Grenoble, France, CEA-Leti, 17 avenue des Martyrs, Cedex 9, Grenoble, France
Abstract
Dry strip processes performed after implantation steps have to remove efficiently the photoresist mask protecting the non-implanted area without leaving any defects on the substrate. In this study bubble-like defects called blisters are observed on implanted areas after several N2H2 dry strip processes. Analyses have been performed to study the blistering phenomenon. The formation of these defects is due to hydrogen diffusion and accumulation in the amorphized silicon layer formed by the implantation step. The effects of implantation parameters (dopant species, dose and energy) on blister formation have been demonstrated. The experimental results have been compared to simulations (using SRIM software) highlighting the main influence of amorphization rate against amorphized layer thickness. Optimization of the stripping process and integration modification are then proposed to delay the appearance of the blisters. © 2018 Elsevier B.V.
Author-Keywords
Blister, Defectivity, High dose implant stripping, Hydrogen plasma, Implanted substrate, Stripping
Index-Keywords
Bark stripping, Defects, Nitrogen compounds, Substrates, Blister, Blister formation, Defectivity, High dose, Hydrogen diffusion, Hydrogen plasmas, Implantation parameters, Photoresist stripping, Photoresists
ISSN1679317
LinkLink

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