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Leti @SPIE Advanced Lithography 2019

From 2/26/2019 to 2/28/2019
Convention Center San Jose, California, United States

This year, Leti researchers will present 7 papers at SPIE Advanced Lithography 2019, the world's premiere lithography event where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

Leti will also host a satellite Lithography Workshop in partnership with ARKEMA, and E-BEAM on Thursday, Feb. 28th, 2019, Marriott Hotel, San José, CA.

FREE event by invitation only. For more info, contact


Here are Leti's presentations at SPIE Advanced Lithography 2019:

Tuesday 26th Feb, 2019    

  • Session 3 - Grayscale lithography process study for sub 5µm microlens patterns
    Time: 11:50 am
  • Session 7 - Application of PSD for the extraction of programmed line roughness from SAXS
    Time: 3:40 pm
  • Session 7  - Tilted beam SEM, 3D metrology for industry

       Time: 5 pm


Wednesday 27th Feb, 2019   

  • Session 6 - Performance validation of Mapper's FLX-1200
    Time: 9 am
  • Session 8 - Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy
    Time: 11:10 am
  • Session 4 - 3D Resist Reflow Compact Model for Imager Microlens Shape Optimization
    Time: 4:10 pm


Thursday 28th Feb, 2019 

  • Session 12 -   Sub 10nm patterning using DNA origami

       Time: 1:30 pm

Practical information

San Jose Convention Center
San Jose, California, United States

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