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Event


plasma etch and strip processes for micro-, nano- and bio-technologies

From 6/8/2026 to 6/9/2026
Minatec, Grenoble, France

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Discover CEA-Leti's latest results​ in​​ plasma etching, cleaning and emerging semiconductor manufacturing technologies showcased.

The workshop gathers scientists, engineers and industry partners to discuss advances and challenges in dry etching, plasma processing and related technologies for semiconductor, MEMS and emerging​ applications.

DISCOVER CEA-LETI’S MAJOR SCIENTIFIC RESULTS

With 5 papers, (one keynote) the institute will present this​ year’s major scientific results at PESM 26. including the following topics:  ​

  • Advanced photonics platforms based on SOI, SiN, and heterogeneous integration
  • GeTe plasma etch process development for RF switch applications
  • HBr/H+ Plasma Etching of GeSe-GeTe Chalcogenide Films for Integrated Photonics: Morphology of Blanket and Patterned Structures
  • Reactive ion etching of LiNbO3 waveguides: Influence of fluorine-based gas chemistry on morphology and etch rates
  • Investigating F Plasmas for Chamber Cleaning Efficiency and Environmental Sustainability in Microelectronics
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CEA-Leti scientific papers

Monday 8 June 2026
10:50 - 11:10 a.m
Session 1
Maison MINATEC

1st Author : OUJANBA Mehdi

GeTe plasma etch process development for RF switch applications​

Monday 8 June 2026
1:00 - 1:30 p.m
Session 2
​Maison MINATEC

1st Author (keynote) : HASSAN Karim

Advanced photonics platforms based on SOI, SiN, and heterogeneous integration

Monday 8 June 2026
2:10 - 2:30 p.m
Session 2 
Maison MINATEC

1st Author : BEDOUI Giovann​i​

HBr/H+ Plasma Etching of GeSe-GeTe Chalcogenide Films for Integrated Photonics: Morphology of Blanket and Patterned Structures

Monday 8 June 2026
2:30 - 2:50 p.m
Session 2​
Maison MINATEC

1st Author : SYLVESTRE Nael

Reactive ion etching of LiNbO3 waveguides: Influence of fluorine-based gas chemistry on morphology and etch rates

Tuesday 9 June 2026
​2:20 - 2:40 p.m
Session 5
​Maison MINATEC​

1st Author : BERNARD Nina​
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Investigating F Plasmas for Chamber Cleaning Efficiency and Environmental Sustainability in Microelectronics​

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Monday 8 June 2026
5:40 - 7:00 p.m
P01 - POSTER SESSION
​Maison MINATEC​

P01 : Nicolas POSSEME 
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Benefit of post etch treatment for defectivity improvement in the BEOL​​

Monday 8 June 2026
5:40 - 7:00 p.m
P07 - POSTER SESSION
​Maison MINATEC​

P07 : Sandra KOZUCH​

Study of damages induced by ultra-violet photons from a Cl2/Ar plasma on N-polar n-GaN​

Monday 8 June 2026
5:40 - 7:00 p.m
P20 - POSTER SESSION
​Maison MINATEC​

P20 : Axel MESSAOUDI 
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Study of plasma-surface interactions for direct bonding application​​

Monday 8 June 2026
5:40 - 7:00 p.m
P21 - POSTER SESSION​
​Maison MINATEC​

P21 : Aurélien SARRAZIN 
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How gaseous effluent analysis enhances understanding of plasma processes and paves the way toward​

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ORGANIZING AND
SCIENTIFIC COMMITTEE
​REPRESENTATION​

Thierry CHEVOLLEAU
Patricia PIMENTA-BARROS
​Nicolas POSSEME

More information about ​Organizing and scientific commitee representation

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​DON'T MISS KARIM HASSAN TALK ON ADVANCED PHOTONICS PLATFOR​MS BASED ON SOI, SIN, AND HETEROGENEOUS INTEGRATION​

Session 2: Plasma etching processes for more than Moore applications

June 08, 1:00 - 1:30 p.m

Advanced photonics platforms based on SOI, SiN, and heterogeneous integration

Karim HASSAN 

Lab Director LIPS (Silicon Photonic Integration Laboratory) 

 
​​ © UtopikPhoto - CEA​​​

ABOUT PLASMA ETCH AND STRIP PROCESSES FOR MICRO-, NANO- AND BIO-TECHNOLOGIES​

The workshop gathers scientists, engineers and industry partners to discuss advances and challenges in dry etching, plasma processing and related technologies for semiconductor, MEMS and emerging applications.

DL_Icon.pngMore information on ​PESM’s w​ebsite​

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Practical information

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From 6/8/2026 to 6/9/2026​ | ​Minatec, Grenoble, France​

Website​​​

 Contacts: ​​Thierry Chevolleau or Patricia Pimenta Barros​  with any questions.​​


Top page

CEA-Leti contacts

Thierry Chevolleau

Lab Director LGRA

Patricia Pimenta Barros

Plasma Etching Research Engineer

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