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innovation for industry
From 2/25/2024 to 2/29/2024 San Jose, California, United States
5:00 PM - 5:20 PM PST | Convention Center, Room 210A
Characterization and mitigation of local wafer deformations introduced by direct wafer-to-wafer bonding
Richard J. F. van Haren, Suwen Li, Mart Baars, Blandine Minghetti, Leon van Dijk, Ivanie Mendes, Karine Abadie, Marie-Line Pourteau, Gaelle Mauguen, Michael May, Viorel Balan, Frank Fournel, Laurent Pain, Thomas Plach, Gernot Probst, Markus Wimplinger
4:45 PM - 5:05 PM PST | Convention Center, Room 211B
Understanding plasma etching of grayscale microlenses and multi-height structures for optoelectronic devices
Assia Selmouni, Aurélien Tavernier, Api Warsono, Sébastien Bérard-Bergery, Nicolas Posseme
5:30 PM - 7:00 PM PST | Convention Center, Hall 2
Manufacturing of 3D submicronic structures at wafer scale
Diana Fernandez Rodas, Jérôme Rêche, Raluca Tiron, Ivanie Mendes
5:30 PM - 7:00 PM PST | Convention Center, Hall 2
Fabrication of 3D microstructures by controlled bending of suspended microdisks
Raphaël Feougier, Abdelkader Aliane, Aurélien Sarrazin, Zouhir Mehrez, Nicolas Posseme, Raluca Tiron
5:30 PM - 7:00 PM PST | Convention Center, Hall 2
Small angle x-ray scattering overlay metrology for advanced nodes
Timothée Choisnet, Guillaume Freychet, Yoann Blancquaert, Patrice Gergaud
5:30 PM - 7:00 PM PST | Convention Center, Hall 2
Impact of process parameters on grayscale MEEF
Ujwol Palanchoke, Florian Tomaso, Yorrick Exbrayat, Gaby Bélot, Marie-Line Pourteau, Ivanie Mendes, Juline Saugnier, Aurélien Fay, Sébastien Bérard-Bergery, Elodie Sungauer, Charlotte Beylier, Rémi Coquand, Arthur Bernadac
9:20 AM - 9:40 AM PST | Convention Center, Grand Ballroom 220C
Life Cycle Assessment of etching processes for FDSOI transistors technologies
Mickael Renaud, Aurélien Sarrazin, Joao Lopes-Barbosa, Yannick Rivoira, Isabelle Servin, François Boulard
11:15 AM - 11: 35 AM PST I Convention Center, Room 210C
A deep learning workflow to generate free-form masks for grayscale lithography
Merlin Moreau, Jean-Baptiste Henry, Stéphane Bonnet
Dates: 25 February - 29 February 2024
Location: San Jose, California, United States
Website: click here
Technical program: click here
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CEA is a French government-funded technological research organisation in four main areas: low-carbon energies, defense and security, information technologies and health technologies. A prominent player in the European Research Area, it is involved in setting up collaborative projects with many partners around the world.
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