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DSA process window expansion with novel DSA track hardware

Published on 29 March 2018
DSA process window expansion with novel DSA track hardware
Harumoto M., Stokes H., Tanaka Y., Kaneyama K., Pieczulewski C., Asai M., Argoud M., Servin I., Chamiot-Maitral G., Claveau G., Tiron R., Cayrefourcq I.
Source-TitleProceedings of SPIE - The International Society for Optical Engineering
SCREEN Semiconductor Solutions Co.,Ltd., 480-1 Takamiya-cho, Hikone, Shiga, Japan, SCREEN SPE Germany GmbH, Fraunhoferstrasse 7, Ismaning, Germany, CEA-LETI MINATEC, 17 Rue des Martyrs, Grenoble, Cedex 9, France, ARKEMA France, 420 rue d'Estienne d'Orves, Colombes, France
PS-b-PMMA block copolymer is a well-known DSA material, and there are many DSA patterning methods that make effective the use of such 1st generation materials. Consequently, this variety of patterning methods opens a wide array of possibilities for DSA application[1-4]. Last year, during the inaugural International DSA Symposium, researchers and lithographers concurred on common key issues for DSA patterning methods such as: defect density, LWR, placement error, etc. Defect density was specifically expressed as the biggest obstacle for new processes. Coat-Develop track systems contribute to the DSA pattern fabrication and also influence the DSA pattern performances[4]. In this study, defectivity was investigated using an atmosphere-controlled chamber on the SOKUDO DUO track. As an initial step for expanding the DSA process window, fingerprint patterns were used for various atmospheric conditions during DSA self-Assembly annealing. In this study, we will demonstrate an improved DSA process window, and then we will discuss the mechanism for this atmospheric effect. © 2017 SPIE.
Atmosphere control, Coat develop track, Defectivity, Directed self-Assembly (DSA), Fingerprint, Graphoepitaxy
Block copolymers, Defects, Self assembly, Atmosphere controls, Coat develop track, Defectivity, Directed self-assembly, Fingerprint, Graphoepitaxy, Defect density

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