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Presentations Workshop Lithography 2018

Published on 22 August 2018

Thank you for attending Leti Lithography Workshop 

To download our presentations, please click on the tittle of each presentation:


  • Introduction: the importance of lithography in today's technologies

         -  Lithography and process variability assumptions for silicon chip manufacturing - Bertrand Le Gratiet - ‎STMicroelectronics -                Senior Principal Engineer, Technical Patterning Coordinator (pdf format)

         -  Lithography technologies for More than Moore devices – YOLE – Amandine Pizzagall (pdf format)

  • ​Alternative lithography 
- MAPPER technology outlook

                MAPPER technology status : Marco Wieland (pdf format)
                FLX-1200 ramp-up status at Leti – Jonathan Pradelles – Leti MAPPER tool team leader (pdf format)

- DSA technology: development status and application fields for CMOS and out of CMOS
               Material and DSA technology insertion demonstration – Joint presentation: (pdf format)

                    - Celia Nicolet DSA material development manager – ARKEMA
                    - Maxime Argoud DSA process integration team leader – Leti

The joint EVG-Leti program for NIL technology assessment   

             EVG NIL technology development - M Wimplinger EVG – Director Business Unit Technology (pdf format)
             INSPIRE program : latest results - Hubert Teyssedre Leti NIL team leader  (pdf format)