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International Workshop on Junction Technology

From 9/28/2026 to 9/29/2026
 INP-Ense³, Grenoble, France

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Explore the future of semiconductor junction technologies with CEA-Leti.

The workshop brings together researchers, engineers and industry experts to discuss the latest advances and challenges in semiconductor junction technology. 

As a member of the organizing committee, with Philippe Rodriguez (CEA-Leti) serving as General Chair, CEA-Leti plays a key role in driving these exchanges and fostering collaboration across the semiconductor ecosystem.


DISCOVER CEA-LETI’S MAJOR SCIENTIFIC RESULTS AT IWJT 26

With 3 papers, the institute will present this year’s major scientific results at IWJT 26, including the following topics:

  • Insights into Early Phase Formation in Ti-Based Contacts for Advanced FD-SOI
  • Advanced materials calibration for nanosecond laser annealing simulations​
  • Ni-Based Ohmic Contacts on p-GaAsSb / InP: Interfacial alloying & Electrical Properties​

CEA-Leti scientific papers​

Monday Sept. 28
11:15 - 11:35 a.m
S2 - 02

1st Author : Marie Merlin

Insights into Early Phase Formation in Ti-Based Contacts for Advanced FD-SOI​​

Tuesday Sept. 29
2:20 - 2:40 p.m
S9 - 02​

1st Author : Gabin Ternin-Rozat​

Advanced materials calibration for nanosecond laser annealing simulations

Tuesday Sept. 29
3:45 - 4:05 p.m
S10 - 02

1st Author :  Ali Ahmad

Ni-Based Ohmic Contacts on p-GaAsSb / InP: Interfacial alloying & Electrical Properties




A CLOSER LOOK AT THE FAMES PILOT LINE

CEA-Leti will also contribute to the IWJT 2026 program with a special session dedicated to the FAMES Pilot Line, presented by Dominique Noguet, FAMES Pilot Line Coordinator.

S3: Special Session

September 28, 1:45 - 2:00 p.m

The FAMES Pilot Line

Dominique NOGUET 

FAMES Pilot Line Coordinator 

 
© Lory Vuillard / CEA​

DISCOVER THE FAMES PILOT LINE AT THE BOOTH​

​ ​​Meet the FAMES experts at the booth to explore the latest breakthroughs in FD-SOI, Embedded Non-Volatile Memories, RF, 3D integration and Power Management ICs.Discover how FAMES is driving innovation in advanced semiconductor technologies and contributing to a strong, sovereign European chip ecosystem. Meet our team to exchange on collaboration opportunities and shape the technologies that will define the future of Europe’s semiconductor industry.

The FAMES Pilot Line of the Chips JU is funded by Horizon Europe and Digital Europe Programmes and  the National Public Authorities of the partners involved. Grants N° 101182279 and 101182297.


ABOUT THE IWJT 2026

The 23ʳᵈ International Workshop on Junction Technology (IWJT 2026) will be held September 28–29, 2026, in Grenoble, France — the first time the workshop leaves Japan and China since its founding in 2000. IWJT is the premier global forum for semiconductor junction formation technology, drawing over 100+ top researchers and engineers from Asia, Europe, and the US each year.

DL_Icon.pngMore information on ​​IWJT's website

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Practical information

From 9/28/2026 to 9/29/2026 | ​INP-Ense³, Grenoble, France

Website​​​

 ContactPhilippe Rodriguez​  with any questions.​​


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CEA-Leti contact

Philippe Rodriguez

Head of Laboratory, CEA-Leti







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