SL-DRT-24-0356
| Research field | Emerging materials and processes for nanotechnologies and microelectronics
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| Domaine-S |
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| Theme | Technological challenges
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| Theme-S |
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| Field | Emerging materials and processes for nanotechnologies and microelectronics
Technological challenges
DRT
DPFT
SPAT
LGRA
Grenoble
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| Title | Innovative dry etching process of exotic materials
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| Abstract | The advantageous properties (electro-optical, - acoustic, -mechanical) of new materials such as Sc-doped ALN, LNO, LTO or KNN make them essential to meet the development needs of integrated optics, RF telecommunication and microsystems. The production of patterns with submicron dimensions with a significant etch rate (>100nm/min), a vertical profile and a reduced roughness of the pattern's sidewalls are the main goals of the thesis work so as to satisfy the performance criteria of the devices targeted at the application level.
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| Formation | Master 2 science des matériaux
Technological Research
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| Contact person | CAMPO
Alain
CEA
DRT/DTSI/SPAT/LGRA
CEA GRENOBLE
0438782810
alain.campo@cea.fr
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| University/ graduate school | Université Grenoble Alpes
Electronique, Electrotechnique, Automatique, Traitement du Signal (EEATS)
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| Thesis supervisor | |
| Location | Département des Plateformes Technologiques (LETI)
Service des procédés de Patterning
Laboratoire Gravure
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| Start | 1/9/2024 |